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Atomic scale evidence of the suppression of boron clustering in implanted silicon by carbon coimplantation.

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Bibliographic Details
Title: Atomic scale evidence of the suppression of boron clustering in implanted silicon by carbon coimplantation.
Authors: Philippe, T., Duguay, S., Mathiot, D.
Source: Journal of Applied Physics; January 15 2011, Vol. 109 Issue 2, p023501-1-023501-4, 4p
Database: Applied Science & Technology Source
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