APA (7th ed.) Citation

Solmi, S., & Baruffaldi, F. (1991). Diffusion of boron in silicon during post-implantation annealing. Journal of Applied Physics, 69, 2135. https://doi.org/10.1063/1.348740

Chicago Style (17th ed.) Citation

Solmi, S., and F. Baruffaldi. "Diffusion of Boron in Silicon During Post-implantation Annealing." Journal of Applied Physics 69 (1991): 2135. https://doi.org/10.1063/1.348740.

MLA (9th ed.) Citation

Solmi, S., and F. Baruffaldi. "Diffusion of Boron in Silicon During Post-implantation Annealing." Journal of Applied Physics, vol. 69, 1991, p. 2135, https://doi.org/10.1063/1.348740.