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Stability towards photoelectrochemical etching in Ga(As,P) alloys.

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Bibliographic Details
Title: Stability towards photoelectrochemical etching in Ga(As,P) alloys.
Authors: Carlsson, Per, Holmström, Bertil, Samuelson, Lars
Source: Journal of Applied Physics; January 15 1988, Vol. 63, p530-532, 3p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501955785
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Stability towards photoelectrochemical etching in Ga(As,P) alloys.
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  Data: <searchLink fieldCode="AU" term="%22Carlsson%2C+Per%22">Carlsson, Per</searchLink><br /><searchLink fieldCode="AU" term="%22Holmström%2C+Bertil%22">Holmström, Bertil</searchLink><br /><searchLink fieldCode="AU" term="%22Samuelson%2C+Lars%22">Samuelson, Lars</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; January 15 1988, Vol. 63, p530-532, 3p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501955785
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1063/1.340082
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      – Code: eng
        Text: English
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        PageCount: 3
        StartPage: 530
    Titles:
      – TitleFull: Stability towards photoelectrochemical etching in Ga(As,P) alloys.
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          Name:
            NameFull: Carlsson, Per
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            NameFull: Holmström, Bertil
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            NameFull: Samuelson, Lars
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            – D: 15
              M: 01
              Text: January 15 1988
              Type: published
              Y: 1988
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              Value: 63
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            – TitleFull: Journal of Applied Physics
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