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Low-temperature beam-induced deposition of thin tin films.

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Bibliographic Details
Title: Low-temperature beam-induced deposition of thin tin films.
Authors: Funsten, H. O., Boring, J. W., Johnson, R. E.
Source: Journal of Applied Physics; February 1 1992, Vol. 71, p1475-1484, 10p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501976452
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Low-temperature beam-induced deposition of thin tin films.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; February 1 1992, Vol. 71, p1475-1484, 10p
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      – Type: doi
        Value: 10.1063/1.351241
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      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 1475
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      – TitleFull: Low-temperature beam-induced deposition of thin tin films.
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            NameFull: Funsten, H. O.
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            NameFull: Boring, J. W.
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            NameFull: Johnson, R. E.
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              Text: February 1 1992
              Type: published
              Y: 1992
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              Value: 71
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