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Growth kinetics and step density in reflection high-energy electron diffraction during molecular-beam epitaxy.

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Bibliographic Details
Title: Growth kinetics and step density in reflection high-energy electron diffraction during molecular-beam epitaxy.
Authors: Clarke, Shaun, Vvedensky, Dimitri D.
Source: Journal of Applied Physics; April 1 1988, Vol. 63, p2272-2283, 12p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501979595
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Growth kinetics and step density in reflection high-energy electron diffraction during molecular-beam epitaxy.
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  Data: <searchLink fieldCode="AU" term="%22Clarke%2C+Shaun%22">Clarke, Shaun</searchLink><br /><searchLink fieldCode="AU" term="%22Vvedensky%2C+Dimitri+D%2E%22">Vvedensky, Dimitri D.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; April 1 1988, Vol. 63, p2272-2283, 12p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501979595
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1063/1.341041
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 12
        StartPage: 2272
    Titles:
      – TitleFull: Growth kinetics and step density in reflection high-energy electron diffraction during molecular-beam epitaxy.
        Type: main
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          Name:
            NameFull: Clarke, Shaun
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            NameFull: Vvedensky, Dimitri D.
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          Dates:
            – D: 01
              M: 04
              Text: April 1 1988
              Type: published
              Y: 1988
          Identifiers:
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              Value: 00218979
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              Value: 63
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            – TitleFull: Journal of Applied Physics
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