APA (7th ed.) Citation

Wille, H., Burte, E., & Ryssel, H. (1992). Simulation of the step coverage for chemical vapor deposited silicon dioxide. Journal of Applied Physics, 71, 3532. https://doi.org/10.1063/1.350908

Chicago Style (17th ed.) Citation

Wille, H., E. Burte, and H. Ryssel. "Simulation of the Step Coverage for Chemical Vapor Deposited Silicon Dioxide." Journal of Applied Physics 71 (1992): 3532. https://doi.org/10.1063/1.350908.

MLA (9th ed.) Citation

Wille, H., et al. "Simulation of the Step Coverage for Chemical Vapor Deposited Silicon Dioxide." Journal of Applied Physics, vol. 71, 1992, p. 3532, https://doi.org/10.1063/1.350908.