Passivation of copper by silicide formation in dilute silane.
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| Title: | Passivation of copper by silicide formation in dilute silane. |
|---|---|
| Authors: | Hymes, S., Murarka, S. P., Shepard, C. |
| Source: | Journal of Applied Physics; May 1 1992, Vol. 71, p4623-4625, 3p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 502010352 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Passivation of copper by silicide formation in dilute silane. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Hymes%2C+S%2E%22">Hymes, S.</searchLink><br /><searchLink fieldCode="AU" term="%22Murarka%2C+S%2E+P%2E%22">Murarka, S. P.</searchLink><br /><searchLink fieldCode="AU" term="%22Shepard%2C+C%2E%22">Shepard, C.</searchLink> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; May 1 1992, Vol. 71, p4623-4625, 3p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=502010352 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/1.350765 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 3 StartPage: 4623 Titles: – TitleFull: Passivation of copper by silicide formation in dilute silane. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Hymes, S. – PersonEntity: Name: NameFull: Murarka, S. P. – PersonEntity: Name: NameFull: Shepard, C. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May 1 1992 Type: published Y: 1992 Identifiers: – Type: issn-print Value: 00218979 Numbering: – Type: volume Value: 71 Titles: – TitleFull: Journal of Applied Physics Type: main |
| ResultId | 1 |
