Plasma reflection edge in thin films of semiconductors.
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| Title: | Plasma reflection edge in thin films of semiconductors. |
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| Authors: | Howson, R. P. |
| Source: | Journal of Physics: D Applied Physics; June 1970, Vol. 3, p863-870, 8p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 516381528 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=516381528 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1088/0022-3727/3/6/305 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 8 StartPage: 863 Titles: – TitleFull: Plasma reflection edge in thin films of semiconductors. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Howson, R. P. IsPartOfRelationships: – BibEntity: Dates: – D: 02 M: 06 Text: June 1970 Type: published Y: 1970 Identifiers: – Type: issn-print Value: 00223727 Numbering: – Type: volume Value: 3 Titles: – TitleFull: Journal of Physics: D Applied Physics Type: main |
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