Lower critical field measurements in NbN bulk and thin films.
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| Title: | Lower critical field measurements in NbN bulk and thin films. |
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| Authors: | Mathur, M. P. |
| Source: | Journal of Applied Physics; July 1972, Vol. 43, p3158-3161, 4p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 516568811 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=516568811 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/1.1661678 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 4 StartPage: 3158 Titles: – TitleFull: Lower critical field measurements in NbN bulk and thin films. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Mathur, M. P. IsPartOfRelationships: – BibEntity: Dates: – D: 02 M: 07 Text: July 1972 Type: published Y: 1972 Identifiers: – Type: issn-print Value: 00218979 Numbering: – Type: volume Value: 43 Titles: – TitleFull: Journal of Applied Physics Type: main |
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