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Electrical pulse breakdown of silicon oxide films.

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Bibliographic Details
Title: Electrical pulse breakdown of silicon oxide films.
Authors: Klein, N., Burstein, E.
Source: Journal of Applied Physics; June 1969, Vol. 40, p2728-2740, 13p
Database: Applied Science & Technology Source
FullText Text:
  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 516705903
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Electrical pulse breakdown of silicon oxide films.
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  Data: <searchLink fieldCode="AU" term="%22Klein%2C+N%2E%22">Klein, N.</searchLink><br /><searchLink fieldCode="AU" term="%22Burstein%2C+E%2E%22">Burstein, E.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; June 1969, Vol. 40, p2728-2740, 13p
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1063/1.1658070
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 13
        StartPage: 2728
    Titles:
      – TitleFull: Electrical pulse breakdown of silicon oxide films.
        Type: main
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      – PersonEntity:
          Name:
            NameFull: Klein, N.
      – PersonEntity:
          Name:
            NameFull: Burstein, E.
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          Dates:
            – D: 01
              M: 06
              Text: June 1969
              Type: published
              Y: 1969
          Identifiers:
            – Type: issn-print
              Value: 00218979
          Numbering:
            – Type: volume
              Value: 40
          Titles:
            – TitleFull: Journal of Applied Physics
              Type: main
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