Low-temperature silicon epitaxy using low pressure chemical vapor deposition with and without plasma enhancement.
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| Title: | Low-temperature silicon epitaxy using low pressure chemical vapor deposition with and without plasma enhancement. |
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| Authors: | Donahue, T. J.1, Burger, W. R.1, Reif, R.1 |
| Source: | Applied Physics Letters; 1984, Vol. 44 Issue 3, p346-348, 3p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 71379973 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Low-temperature silicon epitaxy using low pressure chemical vapor deposition with and without plasma enhancement. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Donahue%2C+T%2E+J%2E%22">Donahue, T. J.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Burger%2C+W%2E+R%2E%22">Burger, W. R.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Reif%2C+R%2E%22">Reif, R.</searchLink><relatesTo>1</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Applied+Physics+Letters%22">Applied Physics Letters</searchLink>; 1984, Vol. 44 Issue 3, p346-348, 3p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=71379973 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/1.94754 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 3 StartPage: 346 Titles: – TitleFull: Low-temperature silicon epitaxy using low pressure chemical vapor deposition with and without plasma enhancement. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Donahue, T. J. – PersonEntity: Name: NameFull: Burger, W. R. – PersonEntity: Name: NameFull: Reif, R. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 02 Text: 1984 Type: published Y: 1984 Identifiers: – Type: issn-print Value: 00036951 Numbering: – Type: volume Value: 44 – Type: issue Value: 3 Titles: – TitleFull: Applied Physics Letters Type: main |
| ResultId | 1 |