Reducing mask write-time-which strategy is best?
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| Title: | Reducing mask write-time-which strategy is best? |
|---|---|
| Authors: | Sehulze, Steffen1, steffenschulze@mentor.com, Lin, Tim2, timlin@mentor.com |
| Source: | Solid State Technology; May2012, Vol. 55 Issue 4, p25-28, 4p |
| Database: | Applied Science & Technology Source |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 75324189 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=75324189 |
| RecordInfo | BibRecord: BibEntity: Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 4 StartPage: 25 Titles: – TitleFull: Reducing mask write-time-which strategy is best? Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Sehulze, Steffen – PersonEntity: Name: NameFull: Lin, Tim IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2012 Type: published Y: 2012 Identifiers: – Type: issn-print Value: 0038111X Numbering: – Type: volume Value: 55 – Type: issue Value: 4 Titles: – TitleFull: Solid State Technology Type: main |
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