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Effects of CH4/SiH4 flow ratio and microwave power on the growth of β-SiC on Si by ECR-CVD using CH4/SiH4/Ar at 200 °C

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Title: Effects of CH4/SiH4 flow ratio and microwave power on the growth of β-SiC on Si by ECR-CVD using CH4/SiH4/Ar at 200 °C
Authors: Lee, Wen-Horng1, Lin, Jing-Cheng1, Lee, Chiapyng1, cl@ch.ntust.edu.tw, Cheng, Huang-Chung2, Yew, Tri-Rung3
Source: Thin Solid Films; Feb2002, Vol. 405 Issue 1/2, p17, 6p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 7762224
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Effects of CH4/SiH4 flow ratio and microwave power on the growth of β-SiC on Si by ECR-CVD using CH4/SiH4/Ar at 200 °C
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  Data: <searchLink fieldCode="AU" term="%22Lee%2C+Wen-Horng%22">Lee, Wen-Horng</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Lin%2C+Jing-Cheng%22">Lin, Jing-Cheng</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Lee%2C+Chiapyng%22">Lee, Chiapyng</searchLink><relatesTo>1</relatesTo>, <i>cl@ch.ntust.edu.tw</i><br /><searchLink fieldCode="AU" term="%22Cheng%2C+Huang-Chung%22">Cheng, Huang-Chung</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Yew%2C+Tri-Rung%22">Yew, Tri-Rung</searchLink><relatesTo>3</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Thin+Solid+Films%22">Thin Solid Films</searchLink>; Feb2002, Vol. 405 Issue 1/2, p17, 6p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=7762224
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      – Type: doi
        Value: 10.1016/S0040-6090(01)01723-0
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 17
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      – TitleFull: Effects of CH4/SiH4 flow ratio and microwave power on the growth of β-SiC on Si by ECR-CVD using CH4/SiH4/Ar at 200 °C
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            NameFull: Lee, Wen-Horng
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            NameFull: Lin, Jing-Cheng
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            NameFull: Lee, Chiapyng
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            NameFull: Cheng, Huang-Chung
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              Text: Feb2002
              Type: published
              Y: 2002
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              Value: 405
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