46.2: Invited Paper: Micron-Patterned Deposition through Shadow masks with high precision alignment for OLED and e-Paper applications.
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| Title: | 46.2: Invited Paper: Micron-Patterned Deposition through Shadow masks with high precision alignment for OLED and e-Paper applications. |
|---|---|
| Authors: | Ambrose, T.1, Tamura, P.1, Brocato, B.1, Bucci, B.1, Conrad, J.1, Shelapinsky, J.1, Sharma, P.1, Little, S. Lauer and W.1 |
| Source: | SID Symposium Digest of Technical Papers; Jun2013, Vol. 44 Issue 1, p637-639, 3p |
| Database: | Applied Science & Technology Source |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 88939185 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=88939185 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1002/j.2168-0159.2013.tb06291.x Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 3 StartPage: 637 Titles: – TitleFull: 46.2: Invited Paper: Micron-Patterned Deposition through Shadow masks with high precision alignment for OLED and e-Paper applications. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Ambrose, T. – PersonEntity: Name: NameFull: Tamura, P. – PersonEntity: Name: NameFull: Brocato, B. – PersonEntity: Name: NameFull: Bucci, B. – PersonEntity: Name: NameFull: Conrad, J. – PersonEntity: Name: NameFull: Shelapinsky, J. – PersonEntity: Name: NameFull: Sharma, P. – PersonEntity: Name: NameFull: Little, S. Lauer and W. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 06 Text: Jun2013 Type: published Y: 2013 Identifiers: – Type: issn-print Value: 0097966X Numbering: – Type: volume Value: 44 – Type: issue Value: 1 Titles: – TitleFull: SID Symposium Digest of Technical Papers Type: main |
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