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Atomic layer deposition of Zn1−xMgxO:Al transparent conducting films.

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Title: Atomic layer deposition of Zn1−xMgxO:Al transparent conducting films.
Authors: Luka, G.1, gluka@ifpan.edu.pl, Witkowski, B. S.1, Wachnicki, L.1, Goscinski, K.1, Jakiela, R.1, Guziewicz, E.1, Godlewski, M.1,2, Zielony, E.3, Bieganski, P.3, Placzek-Popko, E.3, Lisowski, W.4, Sobczak, J. W.4, Jablonski, A.4
Source: Journal of Materials Science; Feb2014, Vol. 49 Issue 4, p1512-1518, 7p, 1 Diagram, 2 Charts, 7 Graphs
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 92889030
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Atomic layer deposition of Zn1−xMgxO:Al transparent conducting films.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Materials+Science%22">Journal of Materials Science</searchLink>; Feb2014, Vol. 49 Issue 4, p1512-1518, 7p, 1 Diagram, 2 Charts, 7 Graphs
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        Value: 10.1007/s10853-013-7832-5
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              Text: Feb2014
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              Y: 2014
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