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Failure of semiclassical models to describe resistivity of nanometric, polycrystalline tungsten films.

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Title: Failure of semiclassical models to describe resistivity of nanometric, polycrystalline tungsten films.
Authors: Dooho Choi1,2, Xuan Liu1, Schelling, Patrick K.3, Coffey, Kevin R.4, Barmak, Katayun1,5
Source: Journal of Applied Physics; 2014, Vol. 115 Issue 10, p104308-1-104308-7, 7p, 1 Diagram, 2 Charts, 5 Graphs
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 95105928
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Failure of semiclassical models to describe resistivity of nanometric, polycrystalline tungsten films.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; 2014, Vol. 115 Issue 10, p104308-1-104308-7, 7p, 1 Diagram, 2 Charts, 5 Graphs
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=95105928
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1063/1.4868093
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 7
        StartPage: 104308-1
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      – TitleFull: Failure of semiclassical models to describe resistivity of nanometric, polycrystalline tungsten films.
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            NameFull: Dooho Choi
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            NameFull: Xuan Liu
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            NameFull: Schelling, Patrick K.
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            NameFull: Coffey, Kevin R.
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            NameFull: Barmak, Katayun
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              M: 03
              Text: 2014
              Type: published
              Y: 2014
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              Value: 00218979
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              Value: 115
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              Value: 10
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            – TitleFull: Journal of Applied Physics
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