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A comparative analysis of different measurement techniques to monitor metal and organic contamination in silicon device processing.

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Title: A comparative analysis of different measurement techniques to monitor metal and organic contamination in silicon device processing.
Authors: Polignano, M. L.1, Codegoni, D.1, Grasso, S.1, Mica, I.1, Borionetti, G.2, Nutsch, A.3
Source: Physica Status Solidi. A: Applications & Materials Science. Mar2015, Vol. 212 Issue 3, p495-505. 11p.
Database: Academic Search Ultimate
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DbLabel: Academic Search Ultimate
An: 101588741
AccessLevel: 2
PubType: Academic Journal
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PreciseRelevancyScore: 0
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=101588741
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        Value: 10.1002/pssa.201400082
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        Text: English
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              Text: Mar2015
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              Y: 2015
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