Teflon/SiO2 Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.
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| Title: | Teflon/SiO |
|---|---|
| Authors: | Ching-Lin Fan1,2 clfan@mail.ntust.edu.tw, Ming-Chi Shang1 d10019004@mail.ntust.edu.tw, Bo-Jyun Li1 m10019004@mail.ntust.edu.tw, Yu-Zuo Lin2 yzlin.ntust@gmail.com, Shea-Jue Wang3 sjwang@ntut.edu.tw, Win-Der Lee4 leewd@mail.lit.edu.tw, Bohr-Ran Hung1 huangbr@mail.ntust.edu.tw |
| Source: | Materials (1996-1944). 2015, Vol. 8 Issue 4, p1704-1713. 10p. 2 Diagrams, 1 Chart, 4 Graphs. |
| Database: | Academic Search Ultimate |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: asn DbLabel: Academic Search Ultimate An: 102298788 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Teflon/SiO<subscript>2</subscript> Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Ching-Lin+Fan%22">Ching-Lin Fan</searchLink><relatesTo>1,2</relatesTo><i> clfan@mail.ntust.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Ming-Chi+Shang%22">Ming-Chi Shang</searchLink><relatesTo>1</relatesTo><i> d10019004@mail.ntust.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Bo-Jyun+Li%22">Bo-Jyun Li</searchLink><relatesTo>1</relatesTo><i> m10019004@mail.ntust.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Yu-Zuo+Lin%22">Yu-Zuo Lin</searchLink><relatesTo>2</relatesTo><i> yzlin.ntust@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Shea-Jue+Wang%22">Shea-Jue Wang</searchLink><relatesTo>3</relatesTo><i> sjwang@ntut.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Win-Der+Lee%22">Win-Der Lee</searchLink><relatesTo>4</relatesTo><i> leewd@mail.lit.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Bohr-Ran+Hung%22">Bohr-Ran Hung</searchLink><relatesTo>1</relatesTo><i> huangbr@mail.ntust.edu.tw</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Materials+%281996-1944%29%22">Materials (1996-1944)</searchLink>. 2015, Vol. 8 Issue 4, p1704-1713. 10p. 2 Diagrams, 1 Chart, 4 Graphs. |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=102298788 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.3390/ma8041704 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 10 StartPage: 1704 Titles: – TitleFull: Teflon/SiO2 Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Ching-Lin Fan – PersonEntity: Name: NameFull: Ming-Chi Shang – PersonEntity: Name: NameFull: Bo-Jyun Li – PersonEntity: Name: NameFull: Yu-Zuo Lin – PersonEntity: Name: NameFull: Shea-Jue Wang – PersonEntity: Name: NameFull: Win-Der Lee – PersonEntity: Name: NameFull: Bohr-Ran Hung IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 04 Text: 2015 Type: published Y: 2015 Identifiers: – Type: issn-print Value: 19961944 Numbering: – Type: volume Value: 8 – Type: issue Value: 4 Titles: – TitleFull: Materials (1996-1944) Type: main |
| ResultId | 1 |