Teflon/SiO2 Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.

Saved in:
Bibliographic Details
Title: Teflon/SiO2 Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.
Authors: Ching-Lin Fan1,2 clfan@mail.ntust.edu.tw, Ming-Chi Shang1 d10019004@mail.ntust.edu.tw, Bo-Jyun Li1 m10019004@mail.ntust.edu.tw, Yu-Zuo Lin2 yzlin.ntust@gmail.com, Shea-Jue Wang3 sjwang@ntut.edu.tw, Win-Der Lee4 leewd@mail.lit.edu.tw, Bohr-Ran Hung1 huangbr@mail.ntust.edu.tw
Source: Materials (1996-1944). 2015, Vol. 8 Issue 4, p1704-1713. 10p. 2 Diagrams, 1 Chart, 4 Graphs.
Database: Academic Search Ultimate
FullText Links:
  – Type: pdflink
Text:
  Availability: 0
Header DbId: asn
DbLabel: Academic Search Ultimate
An: 102298788
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Teflon/SiO<subscript>2</subscript> Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Ching-Lin+Fan%22">Ching-Lin Fan</searchLink><relatesTo>1,2</relatesTo><i> clfan@mail.ntust.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Ming-Chi+Shang%22">Ming-Chi Shang</searchLink><relatesTo>1</relatesTo><i> d10019004@mail.ntust.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Bo-Jyun+Li%22">Bo-Jyun Li</searchLink><relatesTo>1</relatesTo><i> m10019004@mail.ntust.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Yu-Zuo+Lin%22">Yu-Zuo Lin</searchLink><relatesTo>2</relatesTo><i> yzlin.ntust@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Shea-Jue+Wang%22">Shea-Jue Wang</searchLink><relatesTo>3</relatesTo><i> sjwang@ntut.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Win-Der+Lee%22">Win-Der Lee</searchLink><relatesTo>4</relatesTo><i> leewd@mail.lit.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Bohr-Ran+Hung%22">Bohr-Ran Hung</searchLink><relatesTo>1</relatesTo><i> huangbr@mail.ntust.edu.tw</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Materials+%281996-1944%29%22">Materials (1996-1944)</searchLink>. 2015, Vol. 8 Issue 4, p1704-1713. 10p. 2 Diagrams, 1 Chart, 4 Graphs.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=102298788
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.3390/ma8041704
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 10
        StartPage: 1704
    Titles:
      – TitleFull: Teflon/SiO2 Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Ching-Lin Fan
      – PersonEntity:
          Name:
            NameFull: Ming-Chi Shang
      – PersonEntity:
          Name:
            NameFull: Bo-Jyun Li
      – PersonEntity:
          Name:
            NameFull: Yu-Zuo Lin
      – PersonEntity:
          Name:
            NameFull: Shea-Jue Wang
      – PersonEntity:
          Name:
            NameFull: Win-Der Lee
      – PersonEntity:
          Name:
            NameFull: Bohr-Ran Hung
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 04
              Text: 2015
              Type: published
              Y: 2015
          Identifiers:
            – Type: issn-print
              Value: 19961944
          Numbering:
            – Type: volume
              Value: 8
            – Type: issue
              Value: 4
          Titles:
            – TitleFull: Materials (1996-1944)
              Type: main
ResultId 1