Teflon/SiO2 Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process. - Ching-Lin Fan; Ming-Chi Shang; Bo-Jyun Li; Yu-Zuo Lin; Shea-Jue Wang; Win-Der Lee; Bohr-Ran Hung (Materials (1996-1944), 2015)