Solution Layer Deposition: A Technique for the Growth of Ultra-Pure Manganese Oxides on Silica at Room Temperature.
Saved in:
| Title: | Solution Layer Deposition: A Technique for the Growth of Ultra-Pure Manganese Oxides on Silica at Room Temperature. |
|---|---|
| Authors: | Cure, Jérémy1,2,3, Piettre, Kilian1,2,3, Coppel, Yannick1,2, Beche, Eric4, Esvan, Jérôme5, Collière, Vincent1,2, Chaudret, Bruno6, Fau, Pierre1,2 |
| Source: | Angewandte Chemie International Edition. 2/24/2016, Vol. 55 Issue 9, p3027-3030. 4p. |
| Database: | Academic Search Ultimate |
| ISSN: | 14337851 |
|---|---|
| DOI: | 10.1002/anie.201509715 |