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Solution Layer Deposition: A Technique for the Growth of Ultra-Pure Manganese Oxides on Silica at Room Temperature.

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Title: Solution Layer Deposition: A Technique for the Growth of Ultra-Pure Manganese Oxides on Silica at Room Temperature.
Authors: Cure, Jérémy1,2,3, Piettre, Kilian1,2,3, Coppel, Yannick1,2, Beche, Eric4, Esvan, Jérôme5, Collière, Vincent1,2, Chaudret, Bruno6, Fau, Pierre1,2
Source: Angewandte Chemie International Edition. 2/24/2016, Vol. 55 Issue 9, p3027-3030. 4p.
Database: Academic Search Ultimate
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  Data: <searchLink fieldCode="JN" term="%22Angewandte+Chemie+International+Edition%22">Angewandte Chemie International Edition</searchLink>. 2/24/2016, Vol. 55 Issue 9, p3027-3030. 4p.
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        Value: 10.1002/anie.201509715
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      – TitleFull: Solution Layer Deposition: A Technique for the Growth of Ultra-Pure Manganese Oxides on Silica at Room Temperature.
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              Text: 2/24/2016
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