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BN/BNSiO2 sputtering yield shape profiles under stationary plasma thruster operating conditions.

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Title: BN/BNSiO2 sputtering yield shape profiles under stationary plasma thruster operating conditions.
Authors: Ranjan, M.1 ranjanm@ipr.res.in, Sharma, A.1, Vaid, A.1, Bhatt, T.1, Nandalan, V.2, James, M. G.2, Revathi, H.2, Mukherjee, S.1
Source: AIP Advances. 2016, Vol. 6 Issue 9, p1-12. 12p.
Database: Academic Search Ultimate
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An: 118531236
AccessLevel: 2
PubType: Academic Journal
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  Data: BN/BNSiO<subscript>2</subscript> sputtering yield shape profiles under stationary plasma thruster operating conditions.
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  Data: <searchLink fieldCode="JN" term="%22AIP+Advances%22">AIP Advances</searchLink>. 2016, Vol. 6 Issue 9, p1-12. 12p.
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        Value: 10.1063/1.4964312
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        Text: English
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        PageCount: 12
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      – TitleFull: BN/BNSiO2 sputtering yield shape profiles under stationary plasma thruster operating conditions.
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              M: 09
              Text: 2016
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