APA (7th ed.) Citation

Palanichamy, V., Kulkarni, N., & Sarasam, A. S. T. (2019). Improved drain current characteristics of tunnel field effect transistor with heterodielectric stacked structure. International Journal of Nano Dimension, 10(4), 368.

Chicago Style (17th ed.) Citation

Palanichamy, Vimala, Netravathi Kulkarni, and Arun Samuel Thankamony Sarasam. "Improved Drain Current Characteristics of Tunnel Field Effect Transistor with Heterodielectric Stacked Structure." International Journal of Nano Dimension 10, no. 4 (2019): 368.

MLA (9th ed.) Citation

Palanichamy, Vimala, et al. "Improved Drain Current Characteristics of Tunnel Field Effect Transistor with Heterodielectric Stacked Structure." International Journal of Nano Dimension, vol. 10, no. 4, 2019, p. 368.