APA (7th ed.) Citation

Qian, C., Fan, Z., Zheng, W., Bei, R., Zhu, T., Liu, S., . . . Xu, J. (2020). A Facile Strategy for Non-fluorinated Intrinsic Low-k and Low-loss Dielectric Polymers: Valid Exploitation of Secondary Relaxation Behaviors. Chinese Journal of Polymer Science (Springer Science & Business Media B.V.), 38(3), 213. https://doi.org/10.1007/s10118-020-2339-4

Chicago Style (17th ed.) Citation

Qian, Chao, et al. "A Facile Strategy for Non-fluorinated Intrinsic Low-k and Low-loss Dielectric Polymers: Valid Exploitation of Secondary Relaxation Behaviors." Chinese Journal of Polymer Science (Springer Science & Business Media B.V.) 38, no. 3 (2020): 213. https://doi.org/10.1007/s10118-020-2339-4.

MLA (9th ed.) Citation

Qian, Chao, et al. "A Facile Strategy for Non-fluorinated Intrinsic Low-k and Low-loss Dielectric Polymers: Valid Exploitation of Secondary Relaxation Behaviors." Chinese Journal of Polymer Science (Springer Science & Business Media B.V.), vol. 38, no. 3, 2020, p. 213, https://doi.org/10.1007/s10118-020-2339-4.