Baraban, A. P., Denisov, E. A., Dmitriev, V. A., Drozd, A. V., Drozd, V. E., Selivanov, A. A., & Seisyan, R. P. (2020). Features of SiO2 Layers Synthesized on Silicon by Molecular Layer Deposition. Semiconductors, 54(4), 506. https://doi.org/10.1134/S106378262004003X
Chicago Style (17th ed.) CitationBaraban, A. P., E. A. Denisov, V. A. Dmitriev, A. V. Drozd, V. E. Drozd, A. A. Selivanov, and R. P. Seisyan. "Features of SiO2 Layers Synthesized on Silicon by Molecular Layer Deposition." Semiconductors 54, no. 4 (2020): 506. https://doi.org/10.1134/S106378262004003X.
MLA (9th ed.) CitationBaraban, A. P., et al. "Features of SiO2 Layers Synthesized on Silicon by Molecular Layer Deposition." Semiconductors, vol. 54, no. 4, 2020, p. 506, https://doi.org/10.1134/S106378262004003X.