APA (7th ed.) Citation

Guo, H., Zhu, Y., Zhang, Y., Ren, Y., Chen, M., & Zhang, R. (2021). A digital twin-based layout optimization method for discrete manufacturing workshop. International Journal of Advanced Manufacturing Technology, 112(5/6), 1307. https://doi.org/10.1007/s00170-020-06568-0

Chicago Style (17th ed.) Citation

Guo, Hongfei, Yingxin Zhu, Yu Zhang, Yaping Ren, Minshi Chen, and Rui Zhang. "A Digital Twin-based Layout Optimization Method for Discrete Manufacturing Workshop." International Journal of Advanced Manufacturing Technology 112, no. 5/6 (2021): 1307. https://doi.org/10.1007/s00170-020-06568-0.

MLA (9th ed.) Citation

Guo, Hongfei, et al. "A Digital Twin-based Layout Optimization Method for Discrete Manufacturing Workshop." International Journal of Advanced Manufacturing Technology, vol. 112, no. 5/6, 2021, p. 1307, https://doi.org/10.1007/s00170-020-06568-0.