Etching characteristics of si wafer thinning in HF/H2O binary solution for microelectronic and nanopackaging applications.

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Bibliographic Details
Title: Etching characteristics of si wafer thinning in HF/H2O binary solution for microelectronic and nanopackaging applications.
Authors: Ariff, R.1,2, Sheng, C. K.1 chankoksheng@umt.edu.my
Source: Digest Journal of Nanomaterials & Biostructures (DJNB). Jul-Sep2021, Vol. 16 Issue 3, p809-814. 6p.
Database: Academic Search Ultimate
Description
ISSN:18423582
DOI:10.15251/djnb.2021.163.809