Diffusion of Germanium from a Buried SiO2 Layer and Formation of a SiGe Phase.
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| Title: | Diffusion of Germanium from a Buried SiO |
|---|---|
| Authors: | Tyschenko, I. E.1 (AUTHOR) tys@isp.nsc.ru, Khmelnitsky, R. A.2,3 (AUTHOR), Saraykin, V. V.4,5 (AUTHOR), Volodin, V. A.1,6 (AUTHOR), Popov, V. P.1 (AUTHOR) |
| Source: | Semiconductors. Mar2022, Vol. 56 Issue 3, p215-222. 8p. |
| Database: | Academic Search Ultimate |
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| FullText | Links: – Type: pdflink Text: Availability: 1 |
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| Header | DbId: asn DbLabel: Academic Search Ultimate An: 157504984 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Diffusion of Germanium from a Buried SiO<subscript>2</subscript> Layer and Formation of a SiGe Phase. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Tyschenko%2C+I%2E E%2E%22">Tyschenko, I. E.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> tys@isp.nsc.ru</i><br /><searchLink fieldCode="AR" term="%22Khmelnitsky%2C+R%2E A%2E%22">Khmelnitsky, R. A.</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Saraykin%2C+V%2E V%2E%22">Saraykin, V. V.</searchLink><relatesTo>4,5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Volodin%2C+V%2E A%2E%22">Volodin, V. A.</searchLink><relatesTo>1,6</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Popov%2C+V%2E P%2E%22">Popov, V. P.</searchLink><relatesTo>1</relatesTo> (AUTHOR) – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Semiconductors%22">Semiconductors</searchLink>. Mar2022, Vol. 56 Issue 3, p215-222. 8p. |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=157504984 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1134/S1063782622020154 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 8 StartPage: 215 Titles: – TitleFull: Diffusion of Germanium from a Buried SiO2 Layer and Formation of a SiGe Phase. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Tyschenko, I. E. – PersonEntity: Name: NameFull: Khmelnitsky, R. A. – PersonEntity: Name: NameFull: Saraykin, V. V. – PersonEntity: Name: NameFull: Volodin, V. A. – PersonEntity: Name: NameFull: Popov, V. P. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 03 Text: Mar2022 Type: published Y: 2022 Identifiers: – Type: issn-print Value: 10637826 Numbering: – Type: volume Value: 56 – Type: issue Value: 3 Titles: – TitleFull: Semiconductors Type: main |
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