Diffusion of Germanium from a Buried SiO2 Layer and Formation of a SiGe Phase.

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Title: Diffusion of Germanium from a Buried SiO2 Layer and Formation of a SiGe Phase.
Authors: Tyschenko, I. E.1 (AUTHOR) tys@isp.nsc.ru, Khmelnitsky, R. A.2,3 (AUTHOR), Saraykin, V. V.4,5 (AUTHOR), Volodin, V. A.1,6 (AUTHOR), Popov, V. P.1 (AUTHOR)
Source: Semiconductors. Mar2022, Vol. 56 Issue 3, p215-222. 8p.
Database: Academic Search Ultimate
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  Data: <searchLink fieldCode="JN" term="%22Semiconductors%22">Semiconductors</searchLink>. Mar2022, Vol. 56 Issue 3, p215-222. 8p.
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        Value: 10.1134/S1063782622020154
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      – Code: eng
        Text: English
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        PageCount: 8
        StartPage: 215
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      – TitleFull: Diffusion of Germanium from a Buried SiO2 Layer and Formation of a SiGe Phase.
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            NameFull: Tyschenko, I. E.
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            NameFull: Khmelnitsky, R. A.
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            NameFull: Saraykin, V. V.
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            NameFull: Volodin, V. A.
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            NameFull: Popov, V. P.
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              M: 03
              Text: Mar2022
              Type: published
              Y: 2022
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