APA (7th ed.) Citation

Napolitani, E., di Marino, M., de Salvador, D., Carnera, A., Spadafora, M., Mirabella, S., . . . Scalese, S. (2005). Silicon interstitial injection during dry oxidation of SiGe/Si layers. Journal of Applied Physics, 97(3), 036106. https://doi.org/10.1063/1.1844606

Chicago Style (17th ed.) Citation

Napolitani, E., M. di Marino, D. de Salvador, A. Carnera, M. Spadafora, S. Mirabella, A. Terrasi, and S. Scalese. "Silicon Interstitial Injection During Dry Oxidation of SiGe/Si Layers." Journal of Applied Physics 97, no. 3 (2005): 036106. https://doi.org/10.1063/1.1844606.

MLA (9th ed.) Citation

Napolitani, E., et al. "Silicon Interstitial Injection During Dry Oxidation of SiGe/Si Layers." Journal of Applied Physics, vol. 97, no. 3, 2005, p. 036106, https://doi.org/10.1063/1.1844606.