Silicon interstitial injection during dry oxidation of SiGe/Si layers.

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Title: Silicon interstitial injection during dry oxidation of SiGe/Si layers.
Authors: Napolitani, E.1, di Marino, M.1, de Salvador, D.1, Carnera, A.1, Spadafora, M.2, Mirabella, S.2, Terrasi, A.2, Scalese, S.3
Source: Journal of Applied Physics. 2/1/2005, Vol. 97 Issue 3, p036106. 3p. 1 Black and White Photograph, 2 Graphs.
Database: Academic Search Ultimate
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An: 15949652
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Silicon interstitial injection during dry oxidation of SiGe/Si layers.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Napolitani%2C+E%2E%22">Napolitani, E.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22di+Marino%2C+M%2E%22">di Marino, M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22de+Salvador%2C+D%2E%22">de Salvador, D.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Carnera%2C+A%2E%22">Carnera, A.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Spadafora%2C+M%2E%22">Spadafora, M.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Mirabella%2C+S%2E%22">Mirabella, S.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Terrasi%2C+A%2E%22">Terrasi, A.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Scalese%2C+S%2E%22">Scalese, S.</searchLink><relatesTo>3</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>. 2/1/2005, Vol. 97 Issue 3, p036106. 3p. 1 Black and White Photograph, 2 Graphs.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=15949652
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1063/1.1844606
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 3
        StartPage: 036106
    Titles:
      – TitleFull: Silicon interstitial injection during dry oxidation of SiGe/Si layers.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Napolitani, E.
      – PersonEntity:
          Name:
            NameFull: di Marino, M.
      – PersonEntity:
          Name:
            NameFull: de Salvador, D.
      – PersonEntity:
          Name:
            NameFull: Carnera, A.
      – PersonEntity:
          Name:
            NameFull: Spadafora, M.
      – PersonEntity:
          Name:
            NameFull: Mirabella, S.
      – PersonEntity:
          Name:
            NameFull: Terrasi, A.
      – PersonEntity:
          Name:
            NameFull: Scalese, S.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 02
              Text: 2/1/2005
              Type: published
              Y: 2005
          Identifiers:
            – Type: issn-print
              Value: 00218979
          Numbering:
            – Type: volume
              Value: 97
            – Type: issue
              Value: 3
          Titles:
            – TitleFull: Journal of Applied Physics
              Type: main
ResultId 1