Zhang, L., Wang, T., & Lu, X. (2023). Research on weakly alkaline bulk slurries relevant to chemical mechanical polishing for cobalt interconnects. International Journal of Advanced Manufacturing Technology, 125(9/10), 4549. https://doi.org/10.1007/s00170-023-10824-4
Chicago Style (17th ed.) CitationZhang, Lifei, Tongqing Wang, and Xinchun Lu. "Research on Weakly Alkaline Bulk Slurries Relevant to Chemical Mechanical Polishing for Cobalt Interconnects." International Journal of Advanced Manufacturing Technology 125, no. 9/10 (2023): 4549. https://doi.org/10.1007/s00170-023-10824-4.
MLA (9th ed.) CitationZhang, Lifei, et al. "Research on Weakly Alkaline Bulk Slurries Relevant to Chemical Mechanical Polishing for Cobalt Interconnects." International Journal of Advanced Manufacturing Technology, vol. 125, no. 9/10, 2023, p. 4549, https://doi.org/10.1007/s00170-023-10824-4.