APA (7th ed.) Citation

Shang, J., Cheng, Y., Wang, F., & Wang, X. (2024). Sensitize BiVO4 with rhodamine B using BiOCl as a bridge to yield more photoelectrons for photoelectrochemical application. Applied Physics A: Materials Science & Processing, 130(5), 1. https://doi.org/10.1007/s00339-024-07471-1

Chicago Style (17th ed.) Citation

Shang, Jun, Yajing Cheng, Fuqiang Wang, and Xianwei Wang. "Sensitize BiVO4 with Rhodamine B Using BiOCl as a Bridge to Yield More Photoelectrons for Photoelectrochemical Application." Applied Physics A: Materials Science & Processing 130, no. 5 (2024): 1. https://doi.org/10.1007/s00339-024-07471-1.

MLA (9th ed.) Citation

Shang, Jun, et al. "Sensitize BiVO4 with Rhodamine B Using BiOCl as a Bridge to Yield More Photoelectrons for Photoelectrochemical Application." Applied Physics A: Materials Science & Processing, vol. 130, no. 5, 2024, p. 1, https://doi.org/10.1007/s00339-024-07471-1.