Cho, Y., Lin, S., Wang, C., Yang, Y., Ho, Y., & Huang, J. (2024). Periodic atmospheric plasma substrate treatment to improve the hydrophobicity of sputtering PTFE films. Applied Physics A: Materials Science & Processing, 130(9), 1. https://doi.org/10.1007/s00339-024-07838-4
Chicago Style (17th ed.) CitationCho, Yun-Shao, Shih-Chin Lin, Ching-Chiun Wang, Yao-Tsung Yang, Ying-Rong Ho, and Jung-Jie Huang. "Periodic Atmospheric Plasma Substrate Treatment to Improve the Hydrophobicity of Sputtering PTFE Films." Applied Physics A: Materials Science & Processing 130, no. 9 (2024): 1. https://doi.org/10.1007/s00339-024-07838-4.
MLA (9th ed.) CitationCho, Yun-Shao, et al. "Periodic Atmospheric Plasma Substrate Treatment to Improve the Hydrophobicity of Sputtering PTFE Films." Applied Physics A: Materials Science & Processing, vol. 130, no. 9, 2024, p. 1, https://doi.org/10.1007/s00339-024-07838-4.