APA (7th ed.) Citation

Wang, X., Guo, S., Suo, C., Zhang, F., Wang, J., Wang, W., . . . Zhang, X. (2025). Enhancing anion conductivity in a highly alkali-stable eta topologic Cu(I) framework via strong electrostatic repulsion. SCIENCE CHINA Chemistry, 68(3), 980. https://doi.org/10.1007/s11426-024-2464-x

Chicago Style (17th ed.) Citation

Wang, Xiao-Lu, Shaohui Guo, Chao Suo, Fu-Qiang Zhang, Jun-Hao Wang, Wenjing Wang, Daqiang Yuan, Linfeng Liang, and Xian-Ming Zhang. "Enhancing Anion Conductivity in a Highly Alkali-stable Eta Topologic Cu(I) Framework via Strong Electrostatic Repulsion." SCIENCE CHINA Chemistry 68, no. 3 (2025): 980. https://doi.org/10.1007/s11426-024-2464-x.

MLA (9th ed.) Citation

Wang, Xiao-Lu, et al. "Enhancing Anion Conductivity in a Highly Alkali-stable Eta Topologic Cu(I) Framework via Strong Electrostatic Repulsion." SCIENCE CHINA Chemistry, vol. 68, no. 3, 2025, p. 980, https://doi.org/10.1007/s11426-024-2464-x.