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Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy.

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Bibliographic Details
Title: Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy.
Authors: Chen, Weizhou1,2 (AUTHOR), Wang, Liming3 (AUTHOR), Wang, Zi‐Rui1 (AUTHOR), Zhu, Tao3,4 (AUTHOR), Ye, Yuting1,2 (AUTHOR), Li, Qiao‐Hong1 (AUTHOR), Yi, Xiaofeng1 (AUTHOR) xfyi@fjirsm.ac.cn, Zhang, Jian1 (AUTHOR) zhj@fjirsm.ac.cn
Source: Angewandte Chemie International Edition. 1/10/2025, Vol. 64 Issue 2, p1-9. 9p.
Database: Academic Search Ultimate
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ISSN:14337851
DOI:10.1002/anie.202414360