APA (7th ed.) Citation

Zheng, J., Lin, S., Liu, J., Yu, H., Pan, Z., Zheng, R., . . . Wei, Y. (2025). Photochemical fabrication of responsive block copolymer nanoparticles: A self-assembly approach for temperature-sensitive applications. Chemical Papers, 79(6), 3895. https://doi.org/10.1007/s11696-025-04042-3

Chicago Style (17th ed.) Citation

Zheng, Jie, Shengnan Lin, Jianlei Liu, Huanhuan Yu, Zhengbei Pan, Raojun Zheng, Hongmei Yi, and Yen Wei. "Photochemical Fabrication of Responsive Block Copolymer Nanoparticles: A Self-assembly Approach for Temperature-sensitive Applications." Chemical Papers 79, no. 6 (2025): 3895. https://doi.org/10.1007/s11696-025-04042-3.

MLA (9th ed.) Citation

Zheng, Jie, et al. "Photochemical Fabrication of Responsive Block Copolymer Nanoparticles: A Self-assembly Approach for Temperature-sensitive Applications." Chemical Papers, vol. 79, no. 6, 2025, p. 3895, https://doi.org/10.1007/s11696-025-04042-3.