Rhee, M., Won, B., Lim, Y., Song, J., Kim, S., & Oh, I. (2025). Area‐Selective Atomic Layer Deposition on Homogeneous Substrate for Next‐Generation Electronic Devices. Advanced Science, 12(22), 1. https://doi.org/10.1002/advs.202414483
Chicago Style (17th ed.) CitationRhee, Min‐Jeong, Byoungjun Won, Young‐Jin Lim, Jeong‐Gyu Song, Sunghyun Kim, and Il‐Kwon Oh. "Area‐Selective Atomic Layer Deposition on Homogeneous Substrate for Next‐Generation Electronic Devices." Advanced Science 12, no. 22 (2025): 1. https://doi.org/10.1002/advs.202414483.
MLA (9th ed.) CitationRhee, Min‐Jeong, et al. "Area‐Selective Atomic Layer Deposition on Homogeneous Substrate for Next‐Generation Electronic Devices." Advanced Science, vol. 12, no. 22, 2025, p. 1, https://doi.org/10.1002/advs.202414483.