APA (7th ed.) Citation

Seo, H., Ko, G., Song, S., Lee, J. H., Seo, Y., Han, S., . . . Jeon, H. (2025). Topographical Patterning of Cell‐Repellent Interfaces for Immune‐Stealth Implantable Electronics via Multiphoton Ablation Lithography. Advanced Science, 12(34), 1. https://doi.org/10.1002/advs.202506482

Chicago Style (17th ed.) Citation

Seo, Hyunseon, et al. "Topographical Patterning of Cell‐Repellent Interfaces for Immune‐Stealth Implantable Electronics via Multiphoton Ablation Lithography." Advanced Science 12, no. 34 (2025): 1. https://doi.org/10.1002/advs.202506482.

MLA (9th ed.) Citation

Seo, Hyunseon, et al. "Topographical Patterning of Cell‐Repellent Interfaces for Immune‐Stealth Implantable Electronics via Multiphoton Ablation Lithography." Advanced Science, vol. 12, no. 34, 2025, p. 1, https://doi.org/10.1002/advs.202506482.