Topographical Patterning of Cell‐Repellent Interfaces for Immune‐Stealth Implantable Electronics via Multiphoton Ablation Lithography.

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Bibliographic Details
Title: Topographical Patterning of Cell‐Repellent Interfaces for Immune‐Stealth Implantable Electronics via Multiphoton Ablation Lithography.
Authors: Seo, Hyunseon1,2 (AUTHOR), Ko, Gwan‐Jin3 (AUTHOR), Song, Sangmin1,4 (AUTHOR), Lee, Joong Hoon3,5 (AUTHOR), Seo, Youngmin1 (AUTHOR), Han, Sungkeun3 (AUTHOR), Eom, Chan‐Hwi3 (AUTHOR), Kim, Hyewon1 (AUTHOR), Kim, Seongsoo1 (AUTHOR), Lee, Kang‐Sik6 (AUTHOR), Kim, Yu‐Chan1 (AUTHOR), Kim, Hojun1 (AUTHOR), Moon, Si‐Eun1,3 (AUTHOR), Lee, Kyungwoo1 (AUTHOR), Ko, Seung Hwan4 (AUTHOR) maxko@snu.ac.kr, Hwang, Suk‐Won1,3,7 (AUTHOR) dupong76@korea.ac.kr, Jeon, Hojeong1,3 (AUTHOR) jeonhj@kist.re.kr
Source: Advanced Science. 9/11/2025, Vol. 12 Issue 34, p1-11. 11p.
Database: Academic Search Ultimate
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