Chang, W. H., Hatayama, S., Saito, Y., Okada, N., Endo, T., Miyata, Y., & Irisawa, T. (2024). Thermally stable Bi2Te3/WSe2 Van Der Waals contacts for pMOSFETs application. Scientific Reports, 14(1), 1. https://doi.org/10.1038/s41598-024-79750-z
Chicago Style (17th ed.) CitationChang, Wen Hsin, Shogo Hatayama, Yuta Saito, Naoya Okada, Takahiko Endo, Yasumitsu Miyata, and Toshifumi Irisawa. "Thermally Stable Bi2Te3/WSe2 Van Der Waals Contacts for PMOSFETs Application." Scientific Reports 14, no. 1 (2024): 1. https://doi.org/10.1038/s41598-024-79750-z.
MLA (9th ed.) CitationChang, Wen Hsin, et al. "Thermally Stable Bi2Te3/WSe2 Van Der Waals Contacts for PMOSFETs Application." Scientific Reports, vol. 14, no. 1, 2024, p. 1, https://doi.org/10.1038/s41598-024-79750-z.