APA (7th ed.) Citation

Wang, Y., Shi, C., Liu, B., Li, L., Wang, C., Cai, Y., . . . Gong, J. (2026). Controlled Cross‐Linking for Water Developable Hf‐Based Dry Resist Prepared via Molecular Layer Deposition. Small Structures, 7(1), 1. https://doi.org/10.1002/sstr.202500778

Chicago Style (17th ed.) Citation

Wang, Yixian, et al. "Controlled Cross‐Linking for Water Developable Hf‐Based Dry Resist Prepared via Molecular Layer Deposition." Small Structures 7, no. 1 (2026): 1. https://doi.org/10.1002/sstr.202500778.

MLA (9th ed.) Citation

Wang, Yixian, et al. "Controlled Cross‐Linking for Water Developable Hf‐Based Dry Resist Prepared via Molecular Layer Deposition." Small Structures, vol. 7, no. 1, 2026, p. 1, https://doi.org/10.1002/sstr.202500778.