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Controlled Cross‐Linking for Water Developable Hf‐Based Dry Resist Prepared via Molecular Layer Deposition.

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Bibliographic Details
Title:	Controlled Cross‐Linking for Water Developable Hf‐Based Dry Resist Prepared via Molecular Layer Deposition.
Authors:	Wang, Yixian^1,2 (AUTHOR), Shi, Chao^1,2 (AUTHOR), Liu, Bin^1,2 (AUTHOR), Li, Linyang^1,2 (AUTHOR), Wang, Chujun^1,2,3,4,5 (AUTHOR), Cai, Yuan^1,6 (AUTHOR), Guo, Lanxin^1,2 (AUTHOR), Pan, Jian⁷ (AUTHOR), Gong, Hu⁷ (AUTHOR), Wang, Tuo^1,2,3,4,5 (AUTHOR) wangtuo@tju.edu.cn, Gong, Jinlong^1,2,8,9 (AUTHOR)
Source:	Small Structures. Jan2026, Vol. 7 Issue 1, p1-12. 12p.
Database:	Academic Search Ultimate
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