APA (7th ed.) Citation

Lin, Y., Zhong, W., Calzada, S. E., Lach, T. G., Nuckols, L. J., Parish, C. M., . . . Burke, M. G. (2026). Flash electropolishing for TEM: Reducing FIB‐induced defects in tungsten with protocols for new materials#. Journal of Microscopy, 303(2), 154. https://doi.org/10.1111/jmi.70122

Chicago Style (17th ed.) Citation

Lin, Yan‐Ru, Weicheng Zhong, Sabrina E. Calzada, Timothy G. Lach, Lauren J. Nuckols, Chad M. Parish, Steven J. Zinkle, and M. Grace Burke. "Flash Electropolishing for TEM: Reducing FIB‐induced Defects in Tungsten with Protocols for New Materials#." Journal of Microscopy 303, no. 2 (2026): 154. https://doi.org/10.1111/jmi.70122.

MLA (9th ed.) Citation

Lin, Yan‐Ru, et al. "Flash Electropolishing for TEM: Reducing FIB‐induced Defects in Tungsten with Protocols for New Materials#." Journal of Microscopy, vol. 303, no. 2, 2026, p. 154, https://doi.org/10.1111/jmi.70122.