APA (7th ed.) Citation

Silinskas, M., Lisker, M., Matichyn, S., Burte, E. P., Hempel, T., Hyeon, J., . . . Edelmannn, F. (2006). STRONTIUM BISMUTH TANTALATE THIN FILM DEPOSITION BY LIQUID-DELIVERY MOCVD USING NOVEL LIQUID BISMUTH PRECURSORS. Integrated Ferroelectrics, 79(1), 195. https://doi.org/10.1080/10584580600659555

Chicago Style (17th ed.) Citation

Silinskas, M., M. Lisker, S. Matichyn, E. P. Burte, T. Hempel, J. Hyeon, V. Lorenz, and F. Edelmannn. "STRONTIUM BISMUTH TANTALATE THIN FILM DEPOSITION BY LIQUID-DELIVERY MOCVD USING NOVEL LIQUID BISMUTH PRECURSORS." Integrated Ferroelectrics 79, no. 1 (2006): 195. https://doi.org/10.1080/10584580600659555.

MLA (9th ed.) Citation

Silinskas, M., et al. "STRONTIUM BISMUTH TANTALATE THIN FILM DEPOSITION BY LIQUID-DELIVERY MOCVD USING NOVEL LIQUID BISMUTH PRECURSORS." Integrated Ferroelectrics, vol. 79, no. 1, 2006, p. 195, https://doi.org/10.1080/10584580600659555.