Mechanism of Growth of the Ge Wetting Layer Upon Exposure of Si(100)-2 x 1 to GeH4.

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Bibliographic Details
Title: Mechanism of Growth of the Ge Wetting Layer Upon Exposure of Si(100)-2 x 1 to GeH4.
Authors: Chie-Sheng Liu1, Li-Wei Chou1, Lu-Sheng Hong1 hongls@mail.ntust.edu.tw, Jyh-Chiang Jiang1 jcjiang@mail.ntust.edu.tw
Source: Journal of the American Chemical Society. 4/23/2008, Vol. 130 Issue 16, p5440-5442. 3p. 2 Diagrams.
Database: Academic Search Ultimate
Description
ISSN:00027863
DOI:10.1021/ja710802s