Defect reduction of GaAs/Si epitaxy by aspect ratio trapping.
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| Title: | Defect reduction of GaAs/Si epitaxy by aspect ratio trapping. |
|---|---|
| Authors: | Li, J. Z.1, Bai, J.1, Major, C.1, Carroll, M.1, Lochtefeld, A.1, Shellenbarger, Z.2 |
| Source: | Journal of Applied Physics. May2008, Vol. 103 Issue 10, p106102. 3p. 3 Diagrams, 1 Graph. |
| Database: | Academic Search Ultimate |
| FullText | Text: Availability: 0 |
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| Header | DbId: asn DbLabel: Academic Search Ultimate An: 32509918 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=32509918 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/1.2924410 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 3 StartPage: 106102 Titles: – TitleFull: Defect reduction of GaAs/Si epitaxy by aspect ratio trapping. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Li, J. Z. – PersonEntity: Name: NameFull: Bai, J. – PersonEntity: Name: NameFull: Major, C. – PersonEntity: Name: NameFull: Carroll, M. – PersonEntity: Name: NameFull: Lochtefeld, A. – PersonEntity: Name: NameFull: Shellenbarger, Z. IsPartOfRelationships: – BibEntity: Dates: – D: 15 M: 05 Text: May2008 Type: published Y: 2008 Identifiers: – Type: issn-print Value: 00218979 Numbering: – Type: volume Value: 103 – Type: issue Value: 10 Titles: – TitleFull: Journal of Applied Physics Type: main |
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