APA (7th ed.) Citation

Schlossmacher, P., Klenov, D., Freitag, B., & von Harrach, H. (2010). Enhanced Detection Sensitivity with a New Windowless XEDS System for AEM Based on Silicon Drift Detector Technology. Microscopy Today, 18(4), 14. https://doi.org/10.1017/S1551929510000404

Chicago Style (17th ed.) Citation

Schlossmacher, P., D.O Klenov, B. Freitag, and H.S von Harrach. "Enhanced Detection Sensitivity with a New Windowless XEDS System for AEM Based on Silicon Drift Detector Technology." Microscopy Today 18, no. 4 (2010): 14. https://doi.org/10.1017/S1551929510000404.

MLA (9th ed.) Citation

Schlossmacher, P., et al. "Enhanced Detection Sensitivity with a New Windowless XEDS System for AEM Based on Silicon Drift Detector Technology." Microscopy Today, vol. 18, no. 4, 2010, p. 14, https://doi.org/10.1017/S1551929510000404.