Enhanced Detection Sensitivity with a New Windowless XEDS System for AEM Based on Silicon Drift Detector Technology.
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| Title: | Enhanced Detection Sensitivity with a New Windowless XEDS System for AEM Based on Silicon Drift Detector Technology. |
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| Authors: | Schlossmacher, P.1, Klenov, D.O.1, Freitag, B.1, von Harrach, H.S.1 |
| Source: | Microscopy Today. 2010, Vol. 18 Issue 4, p14-20. 7p. |
| Database: | Academic Search Ultimate |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: asn DbLabel: Academic Search Ultimate An: 56776319 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1017/S1551929510000404 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 7 StartPage: 14 Titles: – TitleFull: Enhanced Detection Sensitivity with a New Windowless XEDS System for AEM Based on Silicon Drift Detector Technology. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Schlossmacher, P. – PersonEntity: Name: NameFull: Klenov, D.O. – PersonEntity: Name: NameFull: Freitag, B. – PersonEntity: Name: NameFull: von Harrach, H.S. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 07 Text: 2010 Type: published Y: 2010 Identifiers: – Type: issn-print Value: 15519295 Numbering: – Type: volume Value: 18 – Type: issue Value: 4 Titles: – TitleFull: Microscopy Today Type: main |
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