APA (7th ed.) Citation

Broadbent, E. K., Morgan, A. E., Flanner, J. M., Coulman, B., Sadana, D. K., Burrow, B. J., & Ellwanger, R. C. (1988). The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon. Journal of Applied Physics, 64(12), 6721. https://doi.org/10.1063/1.342003

Chicago Style (17th ed.) Citation

Broadbent, E. K., A. E. Morgan, J. M. Flanner, B. Coulman, D. K. Sadana, B. J. Burrow, and R. C. Ellwanger. "The High-temperature Stability of Chemically Vapor-deposited Tungsten-silicon Couples Rapid Thermal Annealed in Ammonia and Argon." Journal of Applied Physics 64, no. 12 (1988): 6721. https://doi.org/10.1063/1.342003.

MLA (9th ed.) Citation

Broadbent, E. K., et al. "The High-temperature Stability of Chemically Vapor-deposited Tungsten-silicon Couples Rapid Thermal Annealed in Ammonia and Argon." Journal of Applied Physics, vol. 64, no. 12, 1988, p. 6721, https://doi.org/10.1063/1.342003.