The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon.
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| Title: | The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon. |
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| Authors: | Broadbent, E. K., Morgan, A. E., Flanner, J. M., Coulman, B., Sadana, D. K., Burrow, B. J., Ellwanger, R. C. |
| Source: | Journal of Applied Physics. 12/15/1988, Vol. 64 Issue 12, p6721. 6p. |
| Database: | Academic Search Ultimate |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.342003 |
